Spinner

Spin Cleaning Device (Single Wafer)

We are a manufacturer mainly focusing on wafer cleaning device / etching device /
spin dryer etc. / and semiconductor manufacturing device.
We are a company that can manufacture according to your desires, whether small device for research, or automatic device for mass production purposes.
We also develop and manufacture cleaning device for LCD, PDP, organic EL, FED, LED and more with our technology.
We are able to offer at a low price since all products are manufactured within the company.
Please feel free to contact us regarding maintenance for our's and also other companies' products.

  • Automatic Developer

    The single-wafer photoresist developer uniformly sprays a temperature-controlled developer onto the wafer for high-precision development.

    Automatic Developer

    Specification

    Automatic Developer ~φ300m / m
    HEPA or ULPA Optional
    Function Developing temperature control/ spray/ paddle
    Others Hot plate/ cool plate/ rinse/ dry
    Rotation Speed Standard 3000rpm maximum
    IN/OUT Cassette to cassette/ Foup and more
    Conveyor Articulated robot
    Holding method=Edge clamp/ electrostatic/ Bernoulli etc.

  • Automatic Resist Coater

    Applies resist evenly using our unique coating technology.
    Coating under reduced pressure is available as an option.

    Automatic Resist Coater

    Specification

    Wafer Size ～φ300m/m
    HEPA or ULPA Optional
    Function Dispenser/ force feeding tank/ cup cleaning
    Baking Hot plate/ vacuum chamber
    Number of Rotations Standard 5000rpm maximum
    IN/OUT Cassette to cassette / Foup and more
    Conveyor Articulated robot
    Holding method = edge clamp/ electrostatic/ Bernoulli and more

  • Spray Developer

    The system is a spin-type spray developer that develops, rinses, and dries automatically or manually.
    It can process several wafers at the same time.

    Spray Developer

    Specification

    Wafer Size ～φ300m/m
    HEPA or ULPA Optional
    Function Developing liquid temperature control/ spray/ paddle
    Others Rinse/ dry
    Rotation Speed Standard 3000rpm maximum
    IN/OUT Manual
    Number of processing sheets Negotiable

  • Desktop Type Manual Spin Coater

    ¥

    A desktop manual coater corresponding to a 300mm size glass substrate.
    Process conditions are set on the touch panel of the operation panel. A current mode is displayed on the touch panel during each processing mode.

    Desktop Type Manual Spin Coater

    Specification

    External Dimensions W420×D500×H335
    Motor 600W AC Servo Motor 200V
    15A transformer for 100V (optional)
    Number of Rotations 0 to 3000rpm (5000rpm maximum is optional)
    Number of Rotations Display Digital display
    Rotation Accuracy ±1rpm
    Number of Programs 10 programs 50 steps
    Sample Stand Vacuum suction -50Kpa (vacuum pump is optional)
    Inner Cup Φ270 aluminum scraping, surface treatment
    Outer Cup SUS304 φ360 drawing