• Load Lock Type EB Deposition Apparatus

    Load Lock Type EB Deposition Apparatus

    Features

    • High temperature process up to 900 ℃ is possible
    • Achieves great film thickness distribution and reproducibility by rotating the substrate
    • Compatible with high vacuum process by load lock type
    • Particle reduction with optimal surface treatment
    • Easy chamber maintenance
    • Applicable for lift off process
    • Applicable for tray transportation

    Usage

    • LED element
    • Electronic components
    • Optical components
    • MEMS
    • Power device

    Specification

    Substrate Size φ12 inch maximum
    Substrate Heating Temperature 700 ° C (substrate surface)
    700 ° C (substrate surface) Metal or oxide
    Vacuum Exhaust Vacuum Exhaust
    Film Thickness Control Crystal type film thickness sensor
    Control Operation Control: PLC
    Operation: Touch panel or PC
    Data Logging External memory or PC
    Substrate Transfer Vacuum transfer robot
    Optional Substrate heating 900 ° C (substrate surface)
    Substrate cooling
    Substrate bias
    Substrate rotation
    Resistive heating evaporating source (up to 6 units)
    Reaction gas supply unit and more
  • Deposition Apparatus for Organic EL

    Deposition Apparatus for Organic EL

    Overview

    It is a device with multi chamber specifications that is ideal for device and material development.
    Without touching the atmosphere, it can preprocess, form films and seal.
    The plasma cleaning room, organic deposition room, electrode deposition room, sealing room and more can be selected depending on the purpose.

    Features

    • Substrate size supports up to □ 300 mm
    • Deposition cells can be selected from various materials and sizes
    • It can be combined with CVD room, spatter room and more

    Usage

    • Organic EL display
    • Organic EL lighting
  • Two Step Compound Pt Film Deposition Equipment

    Two Step Compound Pt Film Deposition Equipment
  • HDD Media
    Lubrication Deposition Apparatus for Research and Development

    HDD Media Lubrication Deposition Apparatus for Research and Development
  • Load Lock Type
    High Vacuum Ultra High Temperature EB Deposition Apparatus

    Load Lock Type High Vacuum Ultra High Temperature EB Deposition Apparatus
  • Ag Deposition Source for Organic EL

    Ag Deposition Source for Organic EL