• SiO2/SiN PE-CVD System for 300mm

    SiO2/SiN PE-CVD System for 300mm

    Features

    • Low stress, high hardness and high insulation by dual frequency
    • Superior film thickness uniformity and reproducibility
    • Reduction of metal contamination by special surface treatment
    • Significant particle reduction and improved productivity with radical plasma cleaning system
    • Controls wide range of film characteristic
    • Plenty of accumulated data
    • Applicable for tray transportation

    Applications

    • Semiconductor
    • MEMS
    • Organic EL
    • Solar Cell
    • Electronic Components
    • Optical Components

    Specificationss

    Substrate Size φ12 inch maximum
    Process SiH4 : SiO2, SiNx, SiON, a-Si
    TEOS/ TMOS : SiO2
    Plasma Source CCP type
    Substrate Heating Temperature 300 ° C maximum (substrate surface)
    Vacuum Exhaust Low vacuum process: MBP+DP
    High vacuum process: TMP+DP
    Pressure Control Auto pressure control
    Control Operation Control: PLC
    Operation: Touch panel or PC
    Data Logging External memory or PC
    Substrate Transfer Vacuum transfer robot
    Option Plasma Emission monitor
    Exhaust gas treatment system
  • Diamond-Like Carbon (DLC) Coating System

    Diamond-Like Carbon (DLC) Coating System

    Features

    • Substrate heating source can be selected from water cooled type and heated type
    • Ion source can be selected from RF plasma CVD method and ionized deposition method
    • Substrate stage can be selected from water cooled type and heated type
    • Superior film thickness uniformity and reproducibility
    • Processable for various substrate materials
    • Controls wide range of film characteristic
    • Plenty of accumulated data
    • Applicable for tray transportation

    Applications

    • Semiconductor
    • Electronic components
    • Optical components
    • Vehicle components
    • Medical components

    Specificationss

    Substrate Size Round φ12 inch maximum
    Square 310mm x 375mm maximum
    Process Gas DLC:Liquid・Gas
    Fluoride DLC: Liquid
    Self Cleaning Gas O2, Ar, etc.
    Substrate Heating Temperature 300 ° C maximum (substrate surface)
    Vacuum Exhaust Low vacuum process: MBP+DP
    High vacuum process: TMP+DP
    Pressure Control APC
    Control Operation Control: PLC
    Operation: Touch panel or PC
    Data Logging External memory or PC
    Substrate Transfer Vacuum transfer robot
    Option Plasma Emission monitor
    Exhaust gas treatment system
  • Carbon Nanotube Growth System

    Carbon Nanotube Growth System

    Features

    • Fully automated process
    • Substrate plasma cleaning system
    • Superior substrate temperature uniformity and gas flow method
    • Superior film thickness uniformity and reproducibility
    • Plenty of accumulated data

    Applications

    • Energy related
    • Material related
    • Bio related
    • Nano technology related
    • Electronics related

    Specificationss

    Process Gas φ12 inch maximum
    CNT Syngas CH system, H2
    Substrate Heating Temperature 800 ° C maximum (substrate surface)
    Vacuum exhaust RP
    Pressure Control APC
    Control Operation Control: PLC
    Operation: Touch panel or PC
    Data Logging External memory or PC
    Option Substrate automatic transfer system
    Gas detector
    Cylinder cabinet and more
  • 3D CVD System

    3D CVD System

    Features

    • Chamber volume 1m3
    • Original plasma control method
    • Multistage mass processing
    • Simple structure with high versatility
    • Processable for various product materials
    • Controls wide range of film characteristic
    • Plenty of accumulated data

    Applications

    • Sliding parts
    • Sliding components
    • Adornments
    • Vehicle components
    • Machine components

    Specificationss

    Work Size Please contact us as it depends on the shape, size and material.
    Chamber Size 1m×1m×1m
    Film Types DLC, Fluorine DLC, SiOx, SiON
    Self Cleaning Gas O2, Ar, etc
    Vacuum Exhaust MBP+RP
    Pressure Control APC
    Control Operation Control: PLC
    Operation: Touch panel or PC
    Data Logging External memory or PC
    Option Dedicated jig
    Gas detector
    Cylinder cabinet and more
  • Plasma CVD System for Plastic (Polyethylene Terephthalate) bottles

    Plasma CVD Device for "PET Bottles"

    Overview

    Widely used for Diamond-Like Carbon (DLC) coating inside a plastic (Polyethylene Terephthate) bottle by our highly skilled plasma CVD technologies.
    By applying a submicron order of DLC thin film coating to an inner surface of plastic bottles, it prevents flavor degradation due to oxidation and elution of carbonic acid components.
    It also lowers distribution costs by reducing the weight of the bottle.

    Applications

    • We can suggest various equipment configurations depending on the required production quantity.
    • It can be coated up to 3L containers
    • Contact us for bottles or containers larger than 3L.
    • Contact us for resin materials other than PET resin.
    • Contact us about metal materials.
  • HDD Media
    Double-side Ultrathin DLC Film Deposition Unit

    HDD Media Ultra Thin Film DLC Double Sided Film Formation Unit
  • HDD Head
    Multi-Chamber DLC Film Deposition System

    HDD Head DLC Film Formation Device Multi Chamber Specifications
  • HDD Head
    Batch Type DLC Film Deposition System

    HDD Head DLC Film Formation Device Batch Specifications
  • Load-lock Type Plasma CVD System For Research and Development

    Road Lock Type Plasma CVD Device for Research and Development
  • Plasma CVD System For Metal Containers

    Plasma CVD Device for Metal Containers
  • Plasma CVD System For Medical Containers

    Plasma CVD Device for Medical Containers
  • Plasma CVD System For Three-dimensional Objects

    Plasma 3D CVD System
  • 12 inch ALD System For Basic Research and Development

    φ12 Inch Compatible ALD Device for Basic Research and Development
  • ICP Source MOCVD System

    ICP Type MOCVD Device
  • Plasma CVD System For Solar Cells

    Plasma CVD Device for Solar Cells
  • Mass Production Multi-Chamber Plasma CVD System For Glass Substrates

    Glass Substrate Compatible Mass Production Type Multi Chamber Specifications Plasma CVD Device